List of Products

• Modular Process System Plasma modules - RIE/HDP/PECVD/LoadLock& Cluster.
• Photolithography: Exposure System, Mask Aligners, Spin Coater
• Maskless Laser Direct Writing System / Micro Pattern Generators
• Coater & Developer System
• HMDS Vapour Primer
• Spin Rinser Dryer System
• Manual/Automatic Four Point Probes Systems
• Hall Measurement System
• Seebeck Measurement System,
• Micro Probe Stations
• Micro Miniature Refrigerators
• Plasma Etching & Cleaning Systems
• Dry Etching, Reactive Ion Etching System.
• SEM Metrology Tools
• Vacuum Evaporation Systems
• Thermal PVD Systems
• Rapid Thermal Annealing System
• High Temp. Furnaces
• Glove Box Units
• MFC
• Sheet Resistance /Resistivity Measurement System

Nanotechnology

• E Beam Lithography
• Nano-Imprint Lithography System
• Scanning Probe Microscope AFM/STM
• Rotary & Dip Coating Systems
• Electro spinning Units
• Nano Particle Growth System for CNT/Graphene/2D Materials

Materials

High Purity Elements

Wafers

Wafers: Silicon, Thermal Oxide, SOI, Si3N4, Intrinsic, Ge, GaAs, GaP, GaSb, InAs , InP , InSb, ZnO, Sapphire , SiC, ZnS , CdS, CdSe, SrTiO3, MgO, LaAlO3, NaCl , TiO2, LSAT, Quartz Wafer, Fused Silica Wafer, Single Crystal Quartz Wafer, Glass Wafer, GaAs Epitaxial Wafer, AlGaAs Epitaxial Wafer, LT-GaAs Epitaxial Wafer, InP Epitaxial Wafer, InGaAs Epitaxial Wafer, GaN Epitaxial Wafer.

Sputter Targets

99.9% / 99.99% / 99.999%
Ø 1" / Ø 2" / Ø 3" / Ø 4"/ Ø 6" / Ø 8"

• Element Sputter Target
• Rare Earth Sputter Target
• Alloy Sputter Target

Resists

E Beam Resist (PMMA)
Photoresist Positive/Negative Tone (I-line, g-line, DUV)